逆境处理下水稻叶角质层蜡质积累及其与蜡质合成相关基因OsGL1表达的关系

doi:10.3724/SP.J.1006.2012.01115

摘要/Abstract

摘要： 植物角质层蜡质在抵抗各种生物和非生物胁迫中起着非常重要的作用。本试验以水稻(Oryza sativa L.)幼苗为材料, 分别以200 mmol L^-1 NaCl、12% PEG、1.0% H₂O₂、40℃高温和8℃低温为逆境, 研究叶角质层蜡质的积累情况以及其与水稻蜡质合成相关基因OsGL1表达的关系。扫描电镜观察以及叶角质层蜡质总量测定结果表明, 12% PEG、1.0% H₂O₂和8℃低温处理下水稻幼苗叶角质层蜡质的积累明显增加, 而200 mmol L^-1 NaCl和40℃高温处理下叶角质层蜡质覆盖量略有下降。RT-PCR分析显示, 逆境处理下水稻蜡质合成相关基因OsGL1的表达量变化与水稻幼苗叶角质层蜡质的积累存在相关性。

关键词: 水稻, 逆境处理, 角质层蜡质, OsGL1, 表达

Abstract: The outermost surfaces of land plants are covered with a cuticular wax layer which plays a very critical role in defense against biotic and abiotic stresses. GLOSSY1 (GL1) is a wax biosynthesis related gene and OsGL1 is a homologous gene of GL1. In this study, we discussed the leaf cuticular wax accumulation and the relationship between the leaf cuticular wax accumulation and the expression of OsGL1 in rice treated with stresses, including 200 mmol L^-1 NaCl, 12% PEG, 1.0% H₂O₂, high temperature and low temperature in their seedling stages. The scanning electron microscopy and the cuticular wax content analysis showed that the cuticular wax accumulation on leaves significantly increased under 12% PEG, 1.0% H₂O₂ and low temperature treatments. However, the cuticular wax accumulation on leaves declined slightly under NaCl and high temperature treatments. Results of RT-PCR analysis suggested that the expression of OsGL1 under stresses was associated with the accumulation of cuticular wax on leaves.

Key words: Oryza sativa L., Stress treatments, Cuticular wax, OsGL1, Expression

周玲艳，姜大刚，李静，周海，曹伟炜，庄楚雄. 逆境处理下水稻叶角质层蜡质积累及其与蜡质合成相关基因OsGL1表达的关系[J]. 作物学报, 2012, 38(06): 1115-1120.

ZHOU Ling-Yan,JIANG Da-Gang,LI Jing,ZHOU Hai,CAO Wei-Wei,ZHUANG Chu-Xiong. Effect of Stresses on Leaf Cuticular Wax Accumulation and Its Relationship to Expression of OsGL1-Homologous Genes in Rice[J]. Acta Agron Sin, 2012, 38(06): 1115-1120.

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链接本文: https://zwxb.chinacrops.org/CN/10.3724/SP.J.1006.2012.01115

https://zwxb.chinacrops.org/CN/Y2012/V38/I06/1115

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